Résidences

Bemis Center Residency Program 2021

Bemis Center for Contemporary Arts, Omaha, United States
Deadline: 15 August 2020

Bemis Center Residency Program 2021

SPRING + SUMMER RESIDENCY SESSIONS
January 20–April 16, 2021
May 19–August 13, 2021

Total Artists Selected: 20 (10 artists per residency session)

FALL RESIDENCY SESSION
September 8–November 5, 2021

Total Artists Selected: 10

 

For nearly four decades, Bemis Center’s core mission has been to provide artists from around the world dedicated time, space, and resources to conduct research and to create new work across conceptual, material, performative, and social practices. The independently driven atmosphere and communal environment encourage creative growth, experimentation, confrontation of challenges, and cultivation of new ideas. To date, nearly 900 artists have participated in the residency program.

Bemis offers artists-in-residence unmatched technical guidance, access to interns, and an established network of resources. Participants have the opportunity to create networks, collaborate, and share their work with fellow artists-in-residence, organizational partners, and the public. The Bemis Alumni Program extends artist support beyond their Bemis residency through Alumni Residencies, an annual Alumni Award, and Alumni Convenings.

 

STUDIOS AND FACILITIES
Located in downtown Omaha’s historic Old Market, Bemis Center’s campus accommodates a broad range of artistic activity. Selected artists-in-residence enjoy generous sized, private live/work studios complete with a kitchen and bathroom and have 24-hour access to expansive installation and production spaces within Bemis Center’s 110,000 square foot main facility and the Okada Sculpture & Ceramics Facility, a 9,000 square foot large-scale sculpture fabrication space and workshop. A Bemis residency also includes complimentary laundry facilities, utilities, wifi, and access to an on-site research library.

 

STIPENDS
U.S.-based artists-in-residence receive a $1,000 USD monthly stipend and an additional $750 USD travel stipend. Due to the limitations of B2 visas (touring/visiting), international artists-in-residence are eligible to receive reimbursement of qualified expenses, such as airfare, ground transportation, and meals. Bemis Center is not responsible for organizing artist’s travel to Omaha to attend the residency. Additional stipends for studio supplies or materials are not available.

 

ELIGIBILITY
Bemis residency opportunities are open to national and international artists 21+ years of age showing a strong professional working history. A variety of disciplines are accepted including, but not limited to, visual arts, media/new genre, performance, architecture, film/video, literature, interdisciplinary arts, music composition, and choreography.

Bemis residency alumni are allowed to re-apply after a five-year hiatus from the program. Alumni seeking residency must submit a complete application including recent work samples and current resume. Preference may be given to applicants who have not previously attended.

Artists enrolled in an academic program during the time of the residency opportunity are not eligible to apply.

Small collaborative groups are eligible to apply. Please note, if selected, Bemis Center is only able to accommodate two members of a collaborative group to attend the residency and live on-site.

Bemis welcomes internationally based artists to apply. Working knowledge of English is helpful for international artists as an interpreter will not be provided.

Bemis Center for Contemporary Arts is committed to a policy of nondiscrimination and equal opportunity for all persons regardless of race, sex, color, religion, creed, national origin or ancestry, age, marital status, sexual orientation, gender identity, gender expression, and disability. For special needs or questions about accessibility, please contact the Residency Program Manager.

 

OPPORTUNITIES AND EXPECTATIONS
Artists are invited to participate in at least one opportunity for public presentations, such as our public Open House / Open Studios. This is a process-based residency; there is no expectation or promise of an exhibition in our first-floor galleries. Selected artists must attend a minimum of eight consecutive weeks to receive the award. Artists are not able to defer or reschedule if unable to attend the residency.

 

FEES
A $40 USD non-refundable application fee is due at the time of submitting an application through SlideRoom paid via credit card or by PayPal. The submission of completed applications is only accepted online through bemis.slideroom.com. Fees related to visa processes or passport acquisition are the responsibility of the awarded artist.

 

APPLICATION REVIEW PROCESS
SlideRoom will confirm receipt of your submitted application. Residency applications are reviewed by a rotating panel comprised of artists and arts professionals, such as curators, academics, and/or critics. The application review process consists of an online review followed by an on-site panel meeting. The review process takes 12–14 weeks from the application deadline. Notifications to all applicants will be sent via email after the selection panel has made its final decision. If an artist is selected for more than one session, the artist will select one session to attend.

 

REQUIRED APPLICATION MATERIALS

  • Your website
  • Current phone number
  • Current email
  • Current ZIP code
  • Artistic Discipline
  • Are you collaborative?
  • Date of Birth
  • A brief statement about your creative and intellectual interests and description of how you anticipate using the time and space, e.g. working on current projects, conducting research, reading, writing, etc., if you are selected for a residency. (500 words max)
  • Specific resources necessary to your practice you may require while in residency, based on your interests and residency goals previously mentioned. (100 words max)
  • Current Resume. If you are a collaborative group, include a combined resume listing all collaborative members and reflecting previous work history and projects completed as a collaborative. Please list all collaborative members at the top of the resume. PDF format preferred.
  • Two references including name, email, phone number, and relationship to each reference. References will be contacted by Bemis Center during the review panel process. Letters of recommendation are not required.

 

PORTFOLIO

  • Up to ten media samples of work completed within the past five years including images (up to 5MB each), video (up to 250MB each), audio (up to 30MB each), PDFs (up to 10MB each), and/or models (Sketchfab).
  • Images should be no larger than 5MB each, .jpegs or .pdfs are preferred.
  • Each time-based work sample should be up to five minutes in length or less.
  • Text-based media samples should be submitted in .pdf format; 1,500 words max or approximately one page in length, (i.e., one page is the equivalent of one media sample). Works-in-progress may be included. All samples must be submitted in English.
  • Do not include external links to media samples or websites.
  • Do not include multiple pages .pdfs as one media sample. Do not include trailer video samples.

 

OPEN CALL SURVEY
Please answer the following questions for research and statistical purposes.

  • How did you hear about this Bemis Center Residency Program opportunity?
  • What aspect of this residency opportunity inspired you to apply?
  • Would you use your time at Bemis to continue an existing project or create a new project[s]?
  • Residencies you are scheduled to attend next year
  • Previous artist residencies attended
  • Age
  • Race
  • Gender
  • Country of origin
  • Highest level of education

 

SPRING + SUMMER 2021 APPLICATION DEADLINE: May 01, 2020 | 11:59 PM CST
Notifications to all Spring and Summer 2021 applicants will be made via email on August 1, 2020.

FALL 2021 APPLICATION DEADLINE: Deadline: August 15, 2020 | 11:59 PM CST
Notifications to all Fall 2021 applicants will be made via email on December 31, 2020

 

Apply online at bemis.slideroom.com.

 

www.bemiscenter.org